Spatial effects in the 800 keV He-3 implantation in W followed by isochronal annealing at 900 K

by A. De Backer, C. J. Ortiz, C. Domain, M. F. Barthe, C. S. Becquart
Reference:
Spatial effects in the 800 keV He-3 implantation in W followed by isochronal annealing at 900 K (A. De Backer, C. J. Ortiz, C. Domain, M. F. Barthe, C. S. Becquart), In NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, volume 303, 2013.
Bibtex Entry:
@article{ ISI:000320151600021,
Author = {De Backer, A. and Ortiz, C. J. and Domain, C. and Barthe, M. F. and
   Becquart, C. S.},
Title = {{Spatial effects in the 800 keV He-3 implantation in W followed by
   isochronal annealing at 900 K}},
Journal = {{NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM
   INTERACTIONS WITH MATERIALS AND ATOMS}},
Year = {{2013}},
Volume = {{303}},
Pages = {{87-90}},
Month = {{MAY 15}},
DOI = {{10.1016/j.nimb.2012.10.025}},
ISSN = {{0168-583X}},
ResearcherID-Numbers = {{Barthe, Marie-France/C-6751-2008
   Ortiz, Christophe/H-3295-2015}},
ORCID-Numbers = {{Ortiz, Christophe/0000-0002-5146-0651}},
Unique-ID = {{ISI:000320151600021}},
}